Method for manufacturing a charge dissipative surface layer
Patent number: 10763003
Abstract: A method of manufacturing a charge dissipative surface layer on a member made from or consisting of a dielectric polymeric material or polymer-based composite which is intended to be used in space and other extreme environments, the member having at least one surface, in particular two opposing surfaces, each of the surfaces having a flat or a three-dimensional shape. The method includes carbonizing the at least one surface of the member in a vacuum environment through ion bombardment with simultaneous surface renewal in a dynamic way, by bombardment of the at least one surface with an ion beam formed in a gaseous linear high-current technological ion beam source of rare gas and added predetermined amount of a carbonaceous gas in the same ion beam gas admixture in order to achieve a treated carbonized surface layer with a uniform surface resistivity in a charge-dissipative range.
Type: Grant
Filed: May 20, 2016
Date of Patent: September 1, 2020
Assignees: Airbus DS GmbH, Integrity Testing Laboratory Inc.
Inventors: Christel Nömayr, Claus Zimmermann, Zelina Iskanderova, Jacob Kleiman
METHOD FOR MANUFACTURING A CHARGE DISSIPATIVE SURFACE LAYER
Publication number: 20160343464
Abstract: A method of manufacturing a charge dissipative surface layer on a member made from or consisting of a dielectric polymeric material or polymer-based composite which is intended to be used in space and other extreme environments, the member having at least one surface, in particular two opposing surfaces, each of the surfaces having a flat or a three-dimensional shape. The method includes carbonizing the at least one surface of the member in a vacuum environment through ion bombardment with simultaneous surface renewal in a dynamic way, by bombardment of the at least one surface with an ion beam formed in a gaseous linear high-current technological ion beam source of rare gas and added predetermined amount of a carbonaceous gas in the same ion beam gas admixture in order to achieve a treated carbonized surface layer with a uniform surface resistivity in a charge-dissipative range.
Type: Application
Filed: May 20, 2016
Publication date: November 24, 2016
Inventors: Christel NÖMAYR, Claus ZIMMERMANN, Zelina ISKANDEROVA, Jacob KLEIMAN
Method of making charge dissipative surfaces of polymeric materials with low temperature dependence of surface resistivity and low RF loss
Patent number: 9174396
Abstract: A method of making a charge dissipative surface of a dielectric polymeric material with tunable (selectable) surface resistivity, comprises the step of controllably carbonizing the surface of the polymeric material in a vacuum environment by bombarding the polymeric surface with an ion beam of rare gas ions, the energy level of the ion source being from 2.5 to 30 keV, in the fluence range 1E16-5E17 ion/cm2 so as to reach a surface resistivity in the static dissipative range of 1E6 to 1E9 ohm/square at room temperature, with a temperature dependence of less than three orders of magnitude between ?150° C. and +150° C., while having no impact on the RF performance of the material, with high RF power handling capability, and with tunable thermo-optical properties of the surface, including negligible impact on the thermo-optical properties and RF performance of the material, if required by applications.
Type: Grant
Filed: July 3, 2013
Date of Patent: November 3, 2015
Assignees: INTEGRITY TESTING LABORATORY INC., MACDONALD, DETTWILER AND ASSOCIATES CORPORATION
Inventors: Zelina Iskanderova, Jacob I. Kleiman, François Bussières
METHOD OF MAKING CHARGE DISSIPATIVE SURFACES OF POLYMERIC MATERIALS WITH LOW TEMPERATURE DEPENDENCE OF SURFACE RESISTIVITY AND LOW RF LOSS
Publication number: 20130295413
Abstract: A method of making a charge dissipative surface of a dielectric polymeric material with tunable (selectable) surface resistivity, comprises the step of controllably carbonizing the surface of the polymeric material in a vacuum environment by bombarding the polymeric surface with an ion beam of rare gas ions, the energy level of the ion source being from 2.5 to 30 keV, in the fluence range 1E16-5E17 ion/cm2 so as to reach a surface resistivity in the static dissipative range of 1E6 to 1E9 ohm/square at room temperature, with a temperature dependence of less than three orders of magnitude between ?150° C. and +150° C., while having no impact on the RF performance of the material, with high RF power handling capability, and with tunable thermo-optical properties of the surface, including negligible impact on the thermo-optical properties and RF performance of the material, if required by applications.
Type: Application
Filed: July 3, 2013
Publication date: November 7, 2013
Inventors: Zelina Iskanderova, Jacob I. Kleiman, François Bussières
Method of making charge dissipative surfaces of polymeric materials with low temperature dependence of surface resistivity and low RF loss
Publication number: 20100009194
Abstract: A method of making a charge dissipative surface of a polymeric material with low temperature dependence of the tunable surface resistivity, comprises the step of controllably carbonizing the surface of the polymeric material in a vacuum environment by bombarding the polymeric surface with an ion beam of rare gas ions, the energy level of the ion source being from low to moderate so as to reach a surface resistivity in the static dissipative range while having negligible impact on the RF transparency of the material and with tunable thermo-optical properties of the surface, including negligible impact on the thermo-optical properties.
Type: Application
Filed: July 14, 2009
Publication date: January 14, 2010
Inventors: Zelina Iskanderova, Jacob I. Kleiman, Francois Bussières
Surface modification of polymers and carbon-based materials by ion implantation and oxidative conversion
Patent number: 5683757
Abstract: This invention provides an improved process for surface modification of polymers, graphites and carbon-based composite materials, and improved surface-modified materials produced by the process. The preferred surface modification process of the present invention comprises the steps of: high dose single or multiple implantation of the substrate with energetic ions, including ions of at least one metal or semi-metal element able to form a stable, non-volatile oxide; and oxidative full or partial conversion of an upper portion of the implanted layer to a continuous, resistant oxide-enriched surface layer. The process may also comprise the additional implantation of a hardening non-metal element to participate in the formation of a glass-like surface layer or to form a carbonized, hardened sub-layer.
Type: Grant
Filed: August 25, 1995
Date of Patent: November 4, 1997
Inventors: Zelina A. Iskanderova, Jasha I. Kleiman, Yuri Gudimenko, Grant Rheal Cool, Roderick C. Tennyson
